Process Challenges in Compound Semiconductors (1988)

Chapter: ION IMPLANTATION AND ACTIVATION

Previous Chapter: ETCHING AND LITHOGRAPHY
Suggested Citation: "ION IMPLANTATION AND ACTIVATION." National Research Council. 1988. Process Challenges in Compound Semiconductors. Washington, DC: The National Academies Press. doi: 10.17226/19158.
Page 97
Suggested Citation: "ION IMPLANTATION AND ACTIVATION." National Research Council. 1988. Process Challenges in Compound Semiconductors. Washington, DC: The National Academies Press. doi: 10.17226/19158.
Page 98
Suggested Citation: "ION IMPLANTATION AND ACTIVATION." National Research Council. 1988. Process Challenges in Compound Semiconductors. Washington, DC: The National Academies Press. doi: 10.17226/19158.
Page 99
Suggested Citation: "ION IMPLANTATION AND ACTIVATION." National Research Council. 1988. Process Challenges in Compound Semiconductors. Washington, DC: The National Academies Press. doi: 10.17226/19158.
Page 100
Suggested Citation: "ION IMPLANTATION AND ACTIVATION." National Research Council. 1988. Process Challenges in Compound Semiconductors. Washington, DC: The National Academies Press. doi: 10.17226/19158.
Page 101
Suggested Citation: "ION IMPLANTATION AND ACTIVATION." National Research Council. 1988. Process Challenges in Compound Semiconductors. Washington, DC: The National Academies Press. doi: 10.17226/19158.
Page 102
Next Chapter: DIELECTRICS AND METAL CONTACTS FOR GROUP III-V SEMICONDUCTORS
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